UV Lub Teeb 222 Nm Far UVC Downlight Yooj Yim Kev daws teeb meem ntawm UV Disinfection

NTA

1. Ib puag ncig tus phooj ywg / mercury -dawb

2. Kev siv tshuaj tua kab mob zoo

3. Ntshiab 222 nm

4. Lub kaum sab xis me me

5. Dav kev khiav hauj lwm kub

6. Instantaneous on/off

7. Muaj peev xwm ntau lawm

8. Tsis muaj degradation nyob rau hauv cov zis tshaj lub neej ntawm lub teeb

9. Kev ntsuam xyuas spectrum los ntawm tus thib peb - tog

10. EPA, ISO9001, CE tau ntawv pov thawj

SPECIFICATIONS

1. Qauv No.: UWD222-15W

2. Peak Wavelength: 222nm

3. Loj: 6555mm

4. Input Voltage: 24vDC

5. Lub zog: 15w

6. Beam Angle: 60 degree

7. Radiation Intensity: 4000μw/cm²(0cm)

8. Kev Ua Haujlwm Kub Kub: -10 degree - 150 degree

9. Khoom siv: Quartz iav, Ceramic plhaub, Krcl noble gas

10. Lifespan: 4000 teev

APPLICATIONS

Cua tua kab mob

Deg tshuaj tua kab mob

Kev huv huv chav

Kev huv huv rau cov chaw pej xeem

Tsev, chaw ua haujlwm, tsev kawm ntawv, tsev kho mob

Far-UVC lub teeb tiv thaiv MRSA kab mob ntawm cov qhov txhab tawv nqaij hauv vivo

Prevention of superficial surgical wound infections from drug-resistant bacteria such as methicillin resistant Staphylococcus aureus (MRSA) currently present major health care challenges. The majority of surgical site infections (SSI) are believed to be caused by airborne transmission of bacteria alighting onto the wound during surgical procedures. We have previously shown that far-ultraviolet C light in the wavelength range of 207–222 nm is significantly harmful to bacteria, but without damaging mammalian cells and tissues. It is important that the lamp be fitted with a filter to remove light emitted at wavelengths longer than 230 nm which are harmful.

Siv tus qauv tsis muaj plaub hau ntawm tus kab mob ntawm qhov txhab ntawm qhov txhab, ntawm no peb tau sim qhov kev xav tias 222-nm lub teeb tua MRSA alighting mus rau ntawm daim tawv nqaij ntawm daim tawv nqaij ua haujlwm tau zoo li cov kab mob tua kab mob (254 nm), tab sis tsis muaj kev puas tsuaj ntawm daim tawv nqaij.

Txhawm rau simulate qhov xwm txheej uas qhov kev txiav raug mob thaum lub sijhawm phais raws li cov kab mob hauv chav alight ntawm lub qhov txhab, MRSA tau kis rau ntawm thaj tsam ntawm tus nas dorsal ntawm daim tawv nqaij; Cov tawv nqaij raug mob ces raug UVC lub teeb (222 nm los yog 254 nm) ua raws li los ntawm ib tug superficial incision nyob rau hauv lub cheeb tsam, uas yog tam sim ntawd sutured. Ob thiab xya hnub tom qab cov txheej txheem, bactericidal kev ua tau zoo tau ntsuas raws li MRSA colony formation unit (CFU) ib gram ntawm cov tawv nqaij uas tau muab tshem tawm thaum cov qauv kho tau siv los ntsuas cov tawv nqaij puas tsuaj ntsuas raws li cov thickness ntawm epidermal thiab DNA photodamage.

Cov txiaj ntsig tau pom tias nyob rau hauv qhov xwm txheej ntawm cov kab mob sab nraud uas kis tau cov kab mob alighting mus rau qhov txhab, 222-nm lub teeb pom kev zoo tib yam cov kab mob ntawm 254-nm lub teeb tab sis tsis muaj qhov cuam tshuam ntawm daim tawv nqaij.

Ua kom muaj kev nyab xeeb rau cov neeg mob thiab cov neeg ua haujlwm hauv tsev kho mob, peb cov txiaj ntsig tau pom tias nyob deb -UVC lub teeb (uv lub teeb 222 nm deb UVC downlight hloov pauv hloov pauv ntawm uv tshuaj tua kab mob) yuav yog txoj hauv kev yooj yim los tiv thaiv kev sib kis ntawm cov tshuaj- tiv taus kis kab mob hauv qhov chaw kho mob.

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